IEEE - Institute of Electrical and Electronics Engineers, Inc. - Lithography in a 300 mm pilot production line

1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings

Author(s): Ganz, D. ; Charles, A. ; Grant, L. ; Hornig, S. ; Hraschan, G. ; Maltabes, J. ; Metzdorf, T. ; Otto, R. ; Schedel, T. ; Schmidt, S. ; Schuster, R.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Santa Clara, CA, USA, USA
Conference Date: 11 October 1999
Page(s): 357 - 360
ISBN (Paper): 0-7803-5403-6
ISSN (Paper): 1523-553X
DOI: 10.1109/ISSM.1999.808810
Regular:

This paper discusses the performance of the initial 300 mm lithography tool set installed in a pilot line in Dresden, Germany. The product used for evaluating and debugging the tool set is a... View More

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