IEEE - Institute of Electrical and Electronics Engineers, Inc. - In situ HDP-CVD process diagnostics based on quadrupole mass spectrometry

1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings

Author(s): Hughes, C. ; Van Hoeymissen, J.A.B. ; Heyns, M.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Santa Clara, CA, USA, USA
Conference Date: 11 October 1999
Page(s): 209 - 212
ISBN (Paper): 0-7803-5403-6
ISSN (Paper): 1523-553X
DOI: 10.1109/ISSM.1999.808773
Regular:

The technique of quadrupole mass spectrometry is assessed for in situ process monitoring of an HDP-CVD process. A direct, sensitive correlation was obtained between the QMS signal intensity of... View More

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