IEEE - Institute of Electrical and Electronics Engineers, Inc. - Novel dark-field patterned inspection system for 0.15-/spl mu/m CMP processes

1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings

Author(s): Saiki, K. ; Noguchi, M. ; Kondo, Y. ; Watanabe, K. ; Nishiyama, H. ; Hamamatsu, A. ; Oshima, Y.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Santa Clara, CA, USA, USA
Conference Date: 11 October 1999
Page(s): 191 - 194
ISBN (Paper): 0-7803-5403-6
ISSN (Paper): 1523-553X
DOI: 10.1109/ISSM.1999.808769
Regular:

A high-throughput high-sensitivity defect-inspection system has been developed for manufacturing 0.15-/spl mu/m LSI devices and beyond. It incorporates a high-resolution imaging system with a... View More

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