IEEE - Institute of Electrical and Electronics Engineers, Inc. - Implementation of the IMEC-Clean in advanced CMOS manufacturing

1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings

Author(s): Meuris, M. ; Arnauts, S. ; Cornelissen, I. ; Kenis, K. ; Lux, M. ; Degendt, S. ; Mertens, P. ; Teerlinck, I. ; Vos, R. ; Loewenstein, L. ; Heyns, M.M. ; Wolke, K.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Santa Clara, CA, USA, USA
Conference Date: 11 October 1999
Page(s): 157 - 160
ISBN (Paper): 0-7803-5403-6
ISSN (Paper): 1523-553X
DOI: 10.1109/ISSM.1999.808761
Regular:

We present data measured using the wet bench in the prototyping line of IMEC. This wet bench has been running for 3 years an IMEC Clean for prediffusion cleans including the most critical one: the... View More

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