IEEE - Institute of Electrical and Electronics Engineers, Inc. - Cross-contamination control of new materials with minimum number of cleaning apparatuses

1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings

Author(s): Wake, T. ; Fukui, K. ; Hamada, M. ; Inoue, K. ; Aoto, N.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Santa Clara, CA, USA, USA
Conference Date: 11 October 1999
Page(s): 153 - 156
ISBN (Paper): 0-7803-5403-6
ISSN (Paper): 1523-553X
DOI: 10.1109/ISSM.1999.808760
Regular:

We examined the cross-contamination of Co, a newly introduced metal, by measuring the concentration of Co that dissolved into cleaning and wet-process solutions and the concentration of Co that... View More

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