IEEE - Institute of Electrical and Electronics Engineers, Inc. - Application of defect inspection in development of 0.25 and 0.18 micron technology

1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings

Author(s): Guldi, R. ; Winter, T. ; PapaRao, S. ; Smith, J. ; Sridhar, N. ; Garvin, J. ; Metteer, B.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Santa Clara, CA, USA, USA
Conference Date: 11 October 1999
Page(s): 135 - 138
ISBN (Paper): 0-7803-5403-6
ISSN (Paper): 1523-553X
DOI: 10.1109/ISSM.1999.808756
Regular:

We present a general strategy for identifying systematic and random defect issues during the initial stages of development of 0.25 /spl mu/m and 0.18 /spl mu/m logic technology. This strategy... View More

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