IEEE - Institute of Electrical and Electronics Engineers, Inc. - Capture rate enhancement method of 0.1 /spl mu/m-level defects by pattern matching inspectors

1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings

Author(s): Sakurai, K. ; Onoyama, A. ; Ishii, H. ; Oka, K. ; Yamanishi, K.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Santa Clara, CA, USA, USA
Conference Date: 11 October 1999
Page(s): 131 - 134
ISBN (Paper): 0-7803-5403-6
ISSN (Paper): 1523-553X
DOI: 10.1109/ISSM.1999.808755
Regular:

In this paper, a method of enhancing the capture rate of 0.1 /spl mu/m-level defects by pattern matching inspectors is studied from the viewpoint of image variances. The inspection sensitivities... View More

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