IEEE - Institute of Electrical and Electronics Engineers, Inc. - Non-defective area analysis for quantifying yield impact

1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings

Author(s): Ono, M. ; Iwata, H. ; Nemoto, K. ; Watanabe, K.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Santa Clara, CA, USA, USA
Conference Date: 11 October 1999
Page(s): 127 - 130
ISBN (Paper): 0-7803-5403-6
ISSN (Paper): 1523-553X
DOI: 10.1109/ISSM.1999.808754
Regular:

The present paper introduces a novel yield impact quantification method which is designed especially to have robustness to clustered defects and false detection by inspection tools. The yield... View More

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