IEEE - Institute of Electrical and Electronics Engineers, Inc. - Charging protection and degradation by antenna environment on NMOS and PMOS transistors

1999 4th International Symposium on Plasma Process-Induced Damage

Author(s): Carrere, J.-P. ; Heslinga, D.R.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Monterey, CA, USA, USA
Conference Date: 9 May 1999
Page(s): 184 - 187
ISBN (Paper): 0-9651577-3-3
DOI: 10.1109/PPID.1999.798844
Regular:

Plasma induced damage from metal etch and HDP oxide deposition are investigated on CMOS structures for different antenna environments. Grounding the antenna environment provides a good protection... View More

Advertisement