IEEE - Institute of Electrical and Electronics Engineers, Inc. - Suppression of topography dependent charging using a phase-controlled pulsed inductively coupled plasma

1999 4th International Symposium on Plasma Process-Induced Damage

Author(s): Kyoung-Sub Shin ; Wan-Jae Park ; Ji-Soo Kim ; Chang-Jin Kang ; Tae-Hyuk Ahn ; Joo-Tae Moon ; Moon-Yong Lee
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Monterey, CA, USA, USA
Conference Date: 9 May 1999
Page(s): 155 - 158
ISBN (Paper): 0-9651577-3-3
DOI: 10.1109/PPID.1999.798837
Regular:

The topography dependent charging (TDC) potential on the bottom of an oxide contact is measured with an in-situ charge-up monitoring wafer during plasma processing. The effects of the contact... View More

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