IEEE - Institute of Electrical and Electronics Engineers, Inc. - Compounding effects of UV exposure, ion bombardment, electron shading and plasma charging in a high density plasma poly etcher

1999 4th International Symposium on Plasma Process-Induced Damage

Author(s): Shyue-Shyh Lin ; Bing-Yue Tsui ; Chia-Shone Tsai ; Hsia, C.C.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Monterey, CA, USA, USA
Conference Date: 9 May 1999
Page(s): 41 - 44
ISBN (Paper): 0-9651577-3-3
DOI: 10.1109/PPID.1999.798804
Regular:

A complete set of test structures was developed to monitor the compounding effects of UV exposure, ion bombardment, electron shading and plasma charging in a HDP poly etcher. Electron... View More

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