IEEE - Institute of Electrical and Electronics Engineers, Inc. - Concept and initial feasibility of contamination TCAD by integration with commercial software

1999 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop. ASMC 99 Proceedings

Author(s): Hofmeister, J. ; Parks, H.G. ; Vermeire, B. ; Murshalin, Z. ; Graves, R. ; Schrimpf, R.D. ; Galloway, K.F.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Boston, Massachusetts, USA, USA
Conference Date: 8 September 1999
Page(s): 426 - 429
ISBN (Paper): 0-7803-5217-3
ISSN (Paper): 1078-8743
DOI: 10.1109/ASMC.1999.798307
Regular:

Flexible manufacturing of ICs depends on technology computer-aided design (TCAD) tools. As ICs scale, contamination effects become more significant. Metal ions are a major source of poor... View More

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