IEEE - Institute of Electrical and Electronics Engineers, Inc. - Alignment optimization and residual analysis for critical DUV photolithography

1999 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop. ASMC 99 Proceedings

Author(s): Putnam, C. ; Tyminski, J.K. ; Batterson, R. ; Gallo, A.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Boston, Massachusetts, USA, USA
Conference Date: 8 September 1999
Page(s): 378 - 387
ISBN (Paper): 0-7803-5217-3
ISSN (Paper): 1078-8743
DOI: 10.1109/ASMC.1999.798269
Regular:

This work examines the alignment residual data for photolithography imaging in relationship to the maximum-minimum measured overlay values with linear factors corrected. Within the scope of this... View More

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