IEEE - Institute of Electrical and Electronics Engineers, Inc. - Use of multiple lithography monitors in a defect control strategy for high volume manufacturing

1999 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop. ASMC 99 Proceedings

Author(s): Bond, L. ; Sutton, D. ; Turnquest, K.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Boston, Massachusetts, USA, USA
Conference Date: 8 September 1999
Page(s): 265 - 269
ISBN (Paper): 0-7803-5217-3
ISSN (Paper): 1078-8743
DOI: 10.1109/ASMC.1999.798240
Regular:

As I-line and deep ultraviolet (DUV) photolithography processes grow more complex, yield improvement has become more challenging and critical. With the advent of smaller sub-micron geometries... View More

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