IEEE - Institute of Electrical and Electronics Engineers, Inc. - Interferometry for endpoint prediction in gate etching

1999 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop. ASMC 99 Proceedings

Author(s): Layadi, N. ; Lill, T. ; Trevor, J. ; Molloy, S.J. ; Baumann, F. ; Grimbergen, M.N. ; Esry, T.C. ; Chinn, J.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Boston, Massachusetts, USA, USA
Conference Date: 8 September 1999
Page(s): 227 - 232
ISBN (Paper): 0-7803-5217-3
ISSN (Paper): 1078-8743
DOI: 10.1109/ASMC.1999.798230
Regular:

We present results of an interferometric endpoint prediction technique for use in plasma etching of various gate structures in advanced CMOS device fabrication. Etch experiments were carried out... View More

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