IEEE - Institute of Electrical and Electronics Engineers, Inc. - Node connection/quantum phase-shifting mask-path to below 0.3-/spl mu/m pitch, proximity effect free random interconnect and memory patterning

1999 Symposium on VLSI Technology. Digest of Technical Papers

Author(s): H. Fukuda
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 14 June 1999
Page Count: 2
Page(s): 123 - 124
ISBN (Paper): 4-930813-93-X
DOI: 10.1109/VLSIT.1999.799374
Regular:

New design concepts for alternating phase-shifting masks are proposed which enable the alternating PSMs to be applied to random patterns with the least design restrictions and reduced proximity... View More

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