IEEE - Institute of Electrical and Electronics Engineers, Inc. - Current source for pulse plating with high di/dt and low ripple in steady state

Proceedings of ISIE '99. IEEE International Symposium on Industrial Electronics

Author(s): Voncina, D. ; Nastran, J.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Bled, Slovenia, Slovenia
Conference Date: 12 July 1999
Volume: 2
ISBN (Paper): 0-7803-5662-4
DOI: 10.1109/ISIE.1999.798707
Regular:

One of the methods to improve the quality of the metal coats is the use of different current shapes and different polarities instead of a DC current. Many authors have reported about such... View More

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