IEEE - Institute of Electrical and Electronics Engineers, Inc. - Pulsed plasma CVD of fluorocarbon thin films [low-k ILDs]

Proceedings of the IEEE 1999 International Interconnect Technology Conference

Author(s): Labelle, C.B. ; Lau, K.K.S. ; Gleason, K.K.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: San Francisco, CA, USA, USA
Conference Date: 26 May 1999
Page(s): 56 - 58
ISBN (Paper): 0-7803-5174-6
DOI: 10.1109/IITC.1999.787077
Regular:

Pulsed PECVD has been used to deposit a range of fluorocarbon films utilizing three different precursors: hexafluoropropylene oxide (HFPO), 1,1,2,2-tetrafluoroethane (C/sub 2/H/sub 2/F/sub... View More

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