IEEE - Institute of Electrical and Electronics Engineers, Inc. - Step like degradation profile of electromigration of W-plug contact

Proceedings of the IEEE 1999 International Interconnect Technology Conference

Author(s): Guo Qiang ; Lo Keng Foo ; Zeng Xu ; Neo Soh Ping ; Yao Pei ; Oh Chong Khiam
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: San Francisco, CA, USA, USA
Conference Date: 26 May 1999
Page(s): 44 - 46
ISBN (Paper): 0-7803-5174-6
DOI: 10.1109/IITC.1999.787073
Regular:

The electromigration (EM) of a W-plug contact to silicon has been investigated by high resolution resistance measurement (HRRM). Step-like resistance degradation curves was observed in EM tests.... View More

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