IEEE - Institute of Electrical and Electronics Engineers, Inc. - Sheet and line resistance of patterned SOI surface film CD reference materials as a function of substrate bias

Proceedings of International Conference on Microelectronic Test Structures

Author(s): Allen, R.A. ; Vogel, E.M. ; Linholm, L.W. ; Cresswell, M.W.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Goteborg, Sweden, Sweden
Conference Date: 15 March 1999
Page(s): 51 - 55
ISBN (Paper): 0-7803-5270-X
DOI: 10.1109/ICMTS.1999.766215
Regular:

Recently, NIST has been developing electrical test structures to serve as critical dimension (CD) reference artifacts for calibration of CD metrology systems. The reference artifacts are... View More

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