IEEE - Institute of Electrical and Electronics Engineers, Inc. - The fabrication of electrical linewidth structures capable of TEM measurement using standard <100> wafers

Proceedings of International Conference on Microelectronic Test Structures

Author(s): Munro, C.G. ; Gundlach, A.M. ; Stevenson, J.T.M. ; Travis, D.W. ; Smith, S. ; Rankin, N.S. ; Walton, A.J.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Goteborg, Sweden, Sweden
Conference Date: 15 March 1999
Page(s): 13 - 17
ISBN (Paper): 0-7803-5270-X
DOI: 10.1109/ICMTS.1999.766208
Regular:

This paper presents details of a process for fabricating electrical linewidth structures over etched windows so that they potentially can be inspected with a TEM. These ELISTEMs (electrical... View More

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