IEEE - Institute of Electrical and Electronics Engineers, Inc. - Positive resists for electron-beam and X-ray lithography

1998 4th International Conference on Actual Problems of Electronic Instrument Engineering Proceedings. APEIE-98

Author(s): Bulgakova, S.A. ; Mazanova, L.M. ; Semchikov, Yu.D. ; Lopatin, A.Y. ; Luchin, V.I. ; Salashchenko, N.N.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1998
Conference Location: Novosibirsk, Russia, Russia
Conference Date: 23 September 1998
Page(s): 81 - 82
ISBN (Paper): 0-7803-4938-5
DOI: 10.1109/APEIE.1998.768915
Regular:

For the first time the method of chemical modification of polymethylmethacrylate (PMMA) as a positive radiation resist which allows 2-3 fold increase of PMMA sensitivity to radiation... View More

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