IEEE - Institute of Electrical and Electronics Engineers, Inc. - High performance BiCMOS process integration: trends, issues, and future directions

Proceedings of the 1997 Bipolar/BiCMOS Circuits and Technology Meeting

Author(s): Harame, D.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1997
Conference Location: Minneapolis, MN, USA
Conference Date: 28 September 1997
Page(s): 36 - 43
ISBN (Paper): 0-7803-3916-9
ISSN (Paper): 1088-9299
DOI: 10.1109/BIPOL.1997.647351
Regular:

This work will review trends for high performance BiCMOS technology. A section comparing CMOS and Bipolar for RF attempts to forecast the future need for BiCMOS. This is followed by the status on... View More

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