IEEE - Institute of Electrical and Electronics Engineers, Inc. - A new method for the localisation of metallization defects using cathodoluminescence imaging

Proceedings of the 1997 6th International Symposium on the Physical and Failure Analysis of Integrated Circuits

Author(s): Liu, X. ; Phang, J.C.H. ; Chan, D.S.H. ; Chim, W.K.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1997
Conference Location: Singapore
Conference Date: 25 July 1997
Page(s): 264 - 269
ISBN (Paper): 0-7803-3985-1
DOI: 10.1109/IPFA.1997.638343
Regular:

We report a new concept for the localisation of metallization defects by using cathodoluminescence (CL) imaging. The CL image contrast, which is due to the difference in light reflection... View More

Advertisement