IEEE - Institute of Electrical and Electronics Engineers, Inc. - Deep dry etching of SOI for silicon micromachined structures

1997 IEEE International SOI Conference Proceedings

Author(s): McNie, M.E. ; King, D.O. ; Nayar, V. ; Ward, M.C.L. ; Burdess, J.S. ; Quinn, C. ; Blackstone, S.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1997
Conference Location: Fish Camp, CA, USA, USA
Conference Date: 6 October 1997
Page(s): 60 - 61
ISBN (Paper): 0-7803-3938-X
ISSN (Paper): 1078-621X
DOI: 10.1109/SOI.1997.634932
Regular:

This paper reports on preliminary results in the production of novel silicon micromachined structures in thick Silicon On Insulator (SOI) at DERA (Malvern). Significant interest in SOI for... View More

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