IEEE - Institute of Electrical and Electronics Engineers, Inc. - Efficient production of silicon-on-insulator films by co-implantation of He/sup +/ with H/sup +/
1997 IEEE International SOI Conference Proceedings
Author(s): | Agarwal, A. ; Haynes, T.E. ; Venezia, V.C. ; Eaglesham, D.J. ; Welson, M.K. ; Chabal, Y.J. ; Holland, O.W. |
Publisher: | IEEE - Institute of Electrical and Electronics Engineers, Inc. |
Publication Date: | 1 January 1997 |
Conference Location: | Fish Camp, CA, USA, USA |
Conference Date: | 6 October 1997 |
Page(s): | 44 - 45 |
ISBN (Paper): | 0-7803-3938-X |
ISSN (Paper): | 1078-621X |
DOI: | 10.1109/SOI.1997.634924 |
Regular:
The thin film separation process with H/sup +/ proceeds by both chemical interactions (bond breaking and internal surface passivation) and physical interaction (gas coalescence, pressure,... View More