IEEE - Institute of Electrical and Electronics Engineers, Inc. - Next generation lithography-implications

Twenty First IEEE/CPMT International Electronics Manufacturing Technology Symposium Proceedings 1997 IEMT Symposium

Author(s): Trybula, W.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1997
Conference Location: Austin, TX, USA
Conference Date: 13 October 1997
Page(s): 349 - 351
ISBN (Paper): 0-7803-3929-0
ISSN (Paper): 1089-8190
DOI: 10.1109/IEMT.1997.626943
Regular:

The semiconductor industry growth continues to be driven to a large extent by steady advancements in microlithography. The SIA Roadmap renewal is underway and "work-in-process" predicts... View More

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