IEEE - Institute of Electrical and Electronics Engineers, Inc. - Capabilities of existing lithography tools

Twenty First IEEE/CPMT International Electronics Manufacturing Technology Symposium Proceedings 1997 IEMT Symposium

Author(s): Van Peski, C.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1997
Conference Location: Austin, TX, USA
Conference Date: 13 October 1997
Page(s): 346 - 348
ISBN (Paper): 0-7803-3929-0
ISSN (Paper): 1089-8190
DOI: 10.1109/IEMT.1997.626942
Regular:

Lithography tools are key to meeting the requirements of the SIA Roadmap. Current generation tools are meeting the technical requirements of the 0.25 um technology, but challenges remain for the... View More

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