IEEE - Institute of Electrical and Electronics Engineers, Inc. - Photomasks for advanced lithography

Twenty First IEEE/CPMT International Electronics Manufacturing Technology Symposium Proceedings 1997 IEMT Symposium

Author(s): Smith, W. ; Tybula, W.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1997
Conference Location: Austin, TX, USA
Conference Date: 13 October 1997
Page(s): 342 - 345
ISBN (Paper): 0-7803-3929-0
ISSN (Paper): 1089-8190
DOI: 10.1109/IEMT.1997.626941
Regular:

The mask in lithography is the heart of the resulting image on the semiconductor wafer. The mask defines the image to be transferred to the wafer. The evolution of semiconductor manufacturing has... View More

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