IEEE - Institute of Electrical and Electronics Engineers, Inc. - Beyond refractive optical lithography next generation lithography "What's after 193 nm?"

Twenty First IEEE/CPMT International Electronics Manufacturing Technology Symposium Proceedings 1997 IEMT Symposium

Author(s): Seidel, P. ; Canning, J. ; Mackay, S.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1997
Conference Location: Austin, TX, USA
Conference Date: 13 October 1997
Page(s): 334 - 341
ISBN (Paper): 0-7803-3929-0
ISSN (Paper): 1089-8190
DOI: 10.1109/IEMT.1997.626940
Regular:

The integrated circuit industry growth will continue to rely on microlithography as a key enabler to drive chip productivity. Current optical lithography methods (i.e. 193 nm) have been projected... View More

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