IEEE - Institute of Electrical and Electronics Engineers, Inc. - Eigenfeatures for planar pose measurement of partially occluded objects

Proceedings of IEEE Conference on Computer Vision and Pattern Recognition

Author(s): J. Krumm
Sponsor(s): IEEE Comput. Soc. Tech. Committee on Pattern Analysis & Machine Intelligence
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1996
Conference Location: San Francisco, CA, USA, USA
Conference Date: 18 June 1996
Page Count: 6
Page(s): 55 - 60
ISBN (Paper): 0-8186-7259-5
ISSN (Paper): 1063-6919
DOI: 10.1109/CVPR.1996.517053
Regular:

Planar pose measurement from images is an important problem for automated assembly and inspection. In addition to accuracy and robustness, ease of use is very important for real world... View More

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