IEEE - Institute of Electrical and Electronics Engineers, Inc. - Self aligned BM for VLSI using a new diffusion technique for shallow base formation

Author(s): Johnson, F.S. ; Harris, G.S. ; Wortman, J.J. ; Ozturk, M.C.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1993
Conference Location: Santa Barbara, CA, USA, USA
Conference Date: 21 June 1993
Page(s): 18 - 19
DOI: 10.1109/DRC.1993.1009562
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