IEEE - Institute of Electrical and Electronics Engineers, Inc. - Pulsed plasma methods in remote plasma enhanced chemical vapor deposition

International Conference on Plasma Sciences (ICOPS)

Author(s): Peres, I. ; Kushner, M.J.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1993
Conference Location: Vancouver, BC, Canada, Canada
Conference Date: 7 June 1993
ISBN (Paper): 0-7803-1360-7
ISSN (Paper): 0730-9244
DOI: 10.1109/PLASMA.1993.593613
Regular:

Summary form only given. A 2D plasma chemistry simulation has been developed to investigate the selective production of deposition precursors in RPECVD (remote plasma enhanced chemical vapor... View More

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