IEEE - Institute of Electrical and Electronics Engineers, Inc. - Observation of sheath characteristics on a sample undergoing plasma ion implantation

International Conference on Plasma Sciences (ICOPS)

Author(s): Kamath, S. ; Yu, S. ; Roth, J.R.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1993
Conference Location: Vancouver, BC, Canada, Canada
Conference Date: 7 June 1993
ISBN (Paper): 0-7803-1360-7
ISSN (Paper): 0730-9244
DOI: 10.1109/PLASMA.1993.593097
Regular:

Summary form only given. A microwave isolator and a new tuner have been added to the UTK Microwave Plasma Facility (MPF). Plasma ion implantation (PII) is accomplished by pulsed biasing of the... View More

Advertisement