IEEE - Institute of Electrical and Electronics Engineers, Inc. - Design of a large-scale plasma source ion implantation experiment

International Conference on Plasma Sciences (ICOPS)

Author(s): Wood, B.P. ; Rej, D.J. ; Henins, I. ; Scheuer, J.T. ; Reass, W.A. ; Faehl, R.J. ; Nastasi, M.A. ; Olsher, R.H.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1993
Conference Location: Vancouver, BC, Canada, Canada
Conference Date: 7 June 1993
ISBN (Paper): 0-7803-1360-7
ISSN (Paper): 0730-9244
DOI: 10.1109/PLASMA.1993.593096
Regular:

Summary form only given. The authors present the design of a large-scale plasma source ion implantation experiment recently assembled at Los Alamos, in which one has begun implanting targets with... View More

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