IEEE - Institute of Electrical and Electronics Engineers, Inc. - Emissivity correcting pyrometer for temperature measurement in low pressure chemical vapor deposition

Proceedings of 1993 10th Biennial University/Government/ Industry Microelectronics Symposium

Author(s): Fordham, M.J. ; Gansman, R.F. ; Sorrell, F.Y.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1993
Conference Location: Research Triangle Park, NC, USA
Conference Date: 18 May 1993
Page(s): 223 - 228
ISBN (Paper): 0-7803-0990-1
ISSN (Paper): 0749-6877
DOI: 10.1109/UGIM.1993.297057
Regular:

Rapid thermal processing (RTP) low pressure chemical vapor deposition (LPCVD) requires accurate wafer temperature measurement to control film deposition during processing. The temperature sensor... View More

Advertisement