IEEE - Institute of Electrical and Electronics Engineers, Inc. - Incorporation of plasma physics and plasma etching into the undergraduate microelectronics laboratory

Proceedings of 1993 10th Biennial University/Government/ Industry Microelectronics Symposium

Author(s): Fleddermann, C.B. ; Montoya, J. ; Guel, S. ; Hersee, S.D. ; Kendall, D. ; Jungling, K.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1993
Conference Location: Research Triangle Park, NC, USA
Conference Date: 18 May 1993
Page(s): 178 - 182
ISBN (Paper): 0-7803-0990-1
ISSN (Paper): 0749-6877
DOI: 10.1109/UGIM.1993.297011
Regular:

Experiments encompassing basic plasma physics and etching have been incorporated into the undergraduate microelectronics laboratory at the University of New Mexico. This laboratory is part of a... View More

Advertisement