IEEE - Institute of Electrical and Electronics Engineers, Inc. - Fast and extremely selective polyimide etching with a magnetically controlled reactive ion etching system

Author(s): Shimokawa, F. ; Furuya, A. ; Matsui, S.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1991
Conference Location: Nara, Japan
Conference Date: 30 January 1991
Page(s): 192 - 197
ISBN (Paper): 0-87942-641-1
DOI: 10.1109/MEMSYS.1991.114794
Regular:

A dry etching technique using a newly proposed magnetically controlled reactive ion etching (MC-RIE) system to achieve fast and extremely selective polyimide etching is investigated. In this... View More

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