IEEE - Institute of Electrical and Electronics Engineers, Inc. - In situ observation and analysis of wet etching process for micro electro-mechanical systems

Author(s): Tabata, O. ; Shimaoka, K. ; Sugiyama, S.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1991
Conference Location: Nara, Japan
Conference Date: 30 January 1991
Page(s): 99 - 102
ISBN (Paper): 0-87942-641-1
DOI: 10.1109/MEMSYS.1991.114776
Regular:

Details of the etching of polysilicon sacrificial layers using a KOH etching solution have been studied. Etching rates showed strong dependence on KOH concentration and the structure pattern of... View More

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