IEEE - Institute of Electrical and Electronics Engineers, Inc. - Fabrication of assembled micromechanical components via deep X-ray lithography

Author(s): Guckel, K. ; Skrobis, K.J. ; Christenson, T.R. ; Klein, J. ; Han, S. ; Choi, B. ; Lovell, E.G.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1991
Conference Location: Nara, Japan
Conference Date: 30 January 1991
Page(s): 74 - 79
ISBN (Paper): 0-87942-641-1
DOI: 10.1109/MEMSYS.1991.114772
Regular:

A variant of deep X-ray lithography, the LIGA process, is described. The fundamental processing sequence has been augmented with a locally defined sacrificial polyimide layer. This requires... View More

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