IEEE - Institute of Electrical and Electronics Engineers, Inc. - Self-adjusting microstructures (SAMS)

Author(s): Judy, M.W. ; Cho, Y.-H. ; Howe, R.T. ; Pisano, A.P.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1991
Conference Location: Nara, Japan
Conference Date: 30 January 1991
Page(s): 51 - 56
ISBN (Paper): 0-87942-641-1
DOI: 10.1109/MEMSYS.1991.114768
Regular:

Composite LPCVD polysilicon/silicon nitride flexures have been fabricated on the sidewalls of previously patterned polysilicon mesas by anisotropic reactive-ion etching. Cantilever beams 450 nm... View More

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