IEEE - Institute of Electrical and Electronics Engineers, Inc. - Optical exposure systems for three-dimensional fabrication of microprobe

Author(s): Esashi, M. ; Minami, K. ; Shoji, S.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1991
Conference Location: Nara, Japan
Conference Date: 30 January 1991
Page(s): 39 - 44
ISBN (Paper): 0-87942-641-1
DOI: 10.1109/MEMSYS.1991.114766
Regular:

New optical exposure systems for patterning on nonplanar surfaces were developed. One of them is the photoresist exposure system; the other is the Parylene laser ablation system with KrF excimer... View More

Advertisement