IEEE - Institute of Electrical and Electronics Engineers, Inc. - Physically-based models of alignment schemes in commercial steppers

Author(s): Yuan, C.-M. ; Strojwas, A.J.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1990
Conference Location: San Francisco, CA, USA, USA
Conference Date: 9 December 1990
Page(s): 909 - 912
ISSN (Paper): 0163-1918
DOI: 10.1109/IEDM.1990.237015
Regular:

Optical alignment between reticle and wafer in photolithography processes has become one of the limiting factors for achieving submicron design rules. Various alignment schemes have been designed... View More

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