IEEE - Institute of Electrical and Electronics Engineers, Inc. - LPCVD profile simulation using a re-emission model

Author(s): McVittie, J.P. ; Rey, J.C. ; Cheng, L.Y. ; IslamRaja, M.M. ; Saraswat, K.C.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1990
Conference Location: San Francisco, CA, USA, USA
Conference Date: 9 December 1990
Page(s): 917 - 920
ISSN (Paper): 0163-1918
DOI: 10.1109/IEDM.1990.237013
Regular:

A novel, physically based 3D simulator has been developed that includes the dominant effect of re-emission. This simulator is part of the Stanford Profile Emulator for Etching and Deposition in IC... View More

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