IEEE - Institute of Electrical and Electronics Engineers, Inc. - Photolithographic linewidth control considerations on ultrathin fully depleted SOI devices

Author(s): Augenstein, L.L.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1990
Conference Location: Key West, FL, USA, USA
Conference Date: 2 October 1990
Page(s): 81 - 82
ISBN (Paper): 0-87942-573-3
DOI: 10.1109/SOSSOI.1990.145719
Regular:

Linewidth control of printed patterns on thin film on silicon-on-insulator wafers is addressed. Investigations were conducted to understand how variations in the buried oxide layer and the... View More

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