IEEE - Institute of Electrical and Electronics Engineers, Inc. - Demonstration of ACO-Based Freeform Source for ArF Laser Immersion Lithography System

Author(s): Frederick Lie ; Chao-Yi Huang ; Chun-Sheng Wu ; Kao-Tun Chen ; Hung-Fei Kuo
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Volume: PP
Page(s): 1
ISSN (Online): 2169-3536
DOI: 10.1109/ACCESS.2017.2694854
Regular:

This paper describes the use of ArF immersion lithography to verify the feasibility of a self-developed freeform illumination source that exposes features on masks and forms resist patterns. After... View More

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