IEEE - Institute of Electrical and Electronics Engineers, Inc. - Mask Assignment and DSA Grouping for DSA-MP Hybrid Lithography for sub-7nm Contact/Via Holes

Author(s): Yasmine Badr ; Andres Torres ; Puneet Gupta
Sponsor(s): IEEE Council on Electronic Design Automation
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Volume: PP
Page(s): 1
ISSN (Paper): 0278-0070
ISSN (Online): 1937-4151
DOI: 10.1109/TCAD.2016.2614262
Regular:

Directed Self Assembly (DSA) is a very promising candidate for the sub-7nm technology nodes. To print such small dimensions, Multiple Patterning (MP) is likely to be used to print the guiding... View More

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