IEEE - Institute of Electrical and Electronics Engineers, Inc. - Determination of Reactive RF-Sputtering Parameters for Fabrication of SiOx Films With Specified Refractive Index, for Highly Reflective SiOx Distributed Bragg Reflector

Author(s): Elnaz Afsharipour ; Byoungyoul Park ; Cyrus Shafai
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 February 2017
Volume: 9
Page(s): 1 - 16
ISSN (CD): 1943-0647
ISSN (Electronic): 1943-0655
DOI: 10.1109/JPHOT.2017.2649500
Regular:

Fabricating materials with specific refractive indices, which do not naturally exist in the nature, has always been an issue. This paper presents a method for fabricating SiOx films... View More

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