IEEE - Institute of Electrical and Electronics Engineers, Inc. - Discrete Relaxation Method for Triple Patterning Lithography Layout Decomposition

Author(s): Xingquan Li ; Ziran Zhu ; Wenxing Zhu
Sponsor(s): IEEE Comput. Soc. Tech. Committee on Distributed Process
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 February 2017
Volume: 66
Page(s): 285 - 298
ISSN (Paper): 0018-9340
DOI: 10.1109/TC.2016.2582154
Regular:

In this paper, we consider the triple patterning lithography layout decomposition problem. To address the problem, a discrete relaxation theory is built. For designing a discrete relaxation based... View More

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