IEEE - Institute of Electrical and Electronics Engineers, Inc. - Metrology standards for advanced semiconductor lithography referenced to atomic spacings and geometry

Proceedings of IEEE International Conference on Microelectronic Test Structures

Author(s): Teague, E.C. ; Linholm, L.W. ; Cresswell, M.W. ; Penzes, W.B. ; Kramar, J.A. ; Scire, F.E. ; Villarrubia, J.S. ; Jun, J.S.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1993
Conference Location: Sitges, Spain, Spain
Conference Date: 22 March 1993
Page(s): 213 - 217
ISBN (Paper): 0-7803-0857-3
DOI: 10.1109/ICMTS.1993.292918
Regular:

It is shown how the needs for calibrating the positional accuracy of features of an X-ray mask membrane or an optical reticle can be addressed by application of a high-accuracy coordinate... View More

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